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April 2013
David K. Lam,
SM '70, ScD '73
"Mentor capitalist" shares his technical and
business savvy
By Nancy Duvergne Smith
on April 23, 2013
MIT Technology Review |
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April 2013
Dr. David K. Lam featured in "Experiencing Silicon
Valley" memoir by Tom Rigoli |
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March 2013
Another
Key Patent Issued to Multibeam
Multibeam Corporation announces the addition of
another key patent to its IP portfolio. The U.S.
Patent and Trademark Office has granted US Patent #
8,384,048 B2 to Multibeam Corporation.
Read
more... |
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February 2013
David
K. Lam Honored at Engineer’s Week Banquet
Dr. David K. Lam and three other
eminent technologists were honored last night at the
Engineer’s Week Banquet by being inducted into the
Silicon Valley Engineering Hall of Fame.
Read
more... |
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January 2013
2013 SPIE Advanced Lithography is Playing Host to
Industry-veteran David Lam
Dr. David K. Lam and three other
eminent technologists were honored last night at the
Engineer’s Week Banquet by being inducted into the
Silicon Valley Engineering Hall of Fame.
Read
more... |
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November 2012
Technology Entrepreneur David K. Lam Named to
Silicon Valley Engineering Hall of Fame
Dr. David K. Lam, widely known as
the founder of Lam Research
Corporation in 1980, and currently
chairman of both Multibeam
Corporation and the David Lam Group, has been
selected for induction into the distinguished
Silicon Valley Engineering Hall of Fame.
Read
more... |
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October 2012
Multibeam Corporation Announced the Addition of
Another Key Patent to its Portfolio
The U.S. Patent and Trademark Office has granted US
Patent # 8,242,457 B2 to Multibeam Corporation. This
invention relates to the field of charged particle
optics, and in particular to systems for generating
high current density shaped electron beam.
Read
more... |
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July 2012
Lithography
Landscape: E-Beam Lithography Revisited. By Dr.
David K. Lam, Multibeam Corporation
We think you'll enjoy
this article published by Future Fab International,
written by David Lam.
Read
more... |
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February 2012
Dr.
David K. Lam Talks at 2012 SPIE Advanced
Lithography
Tuesday February 14, 2012
San Jose Convention Center
Ballroom J2 - 9:40AM
2012 SPIE Advanced Lithography is playing host to
industry-veteran David Lam.
Read
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February 2012
Dr.
David K. Lam will present at SPIE Advanced
Lithography 2012
12 -
16 February 2012
San Jose Convention Center and San Jose Marriott
San Jose, California, USA
At SPIE Advanced Lithography 2012, Dr. David K. Lam
will present Multiple column high-throughput e-beam
inspection.
Read
more... |
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January 2012
Multibeam Corporation
is a Winner of the Red Herring's 2011 Top 100 Global
Award
Santa Clara, California
- January 3, 2012 - multibeam Corporation announced
that it has been selected as a Winner of the Red
Herring's 2011 Top 100 Global award, a prestigious
recognition honoring the year's most audacious and
far reaching private technology companies and
entrepreneurs from across the globe.
Read
more...
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December 2011
Multibeam Corporation
Selected as a Finalist for Red Herring
Global
Award
December 5, 2011 - Multibeam Corporation
announced that it has been selected as a candidate for
Red Herring's 2011 Top 100 Global award, a prestigious
recognition honoring the year's most audacious and far
reaching private technology companies and entrepreneurs
from across the globe.
Read
more...
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September 2011
E-beam
Lithography Precision at Optical
Lithography Speed: Complementary Lithography
Breaks the NGL Logjam
September 6, 2011
- What is
semiconductor lithography’s current
state? Cost is rising, debate is raging, and
a solution is wanting.
Read
more...
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July 2011
Solid State
Technology Published Today the Column Article Written by
David Lam
The
column summarizes Lam's invited talk on Extending
Optical Lithography with CEBL (Complementary E-Beam
Lithography), scheduled for
Wednesday, July 13, at noon, at the Advanced Lithography
TechXPOT.
Read
more...
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June 2011
Multibeam Corporation Selected as a Red
Herring Top 100 North America Tech Startup
Red Herring announced that it has
selected Multibeam Corporation as a Winner of the Top
100 North America award, a prestigious list honoring the
year's most promising private technology ventures from
the North American business region.
Read
more...
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May
2011
SEM
Substrates Inspection with Multiple Electron Beam
Technology
Santa Clara, CA - Multibeam Corporation
announced the addition of another key patent to its portfolio. The U.S. Patent and Trademark Office
granted US Patent # 7,941,237 to Multibeam Corporation on May 10, 2011.
The patent covers a method to inspect substrates with multiple e-beam
columns.
Read
more...
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April
2011
Another Key Patent Granted to Multibeam Corporation
Santa Clara, CA – The
U.S. Patent and Trademark Office granted Multibeam
Corporation another key patent. US Patent #7,928,404
was issued to Multibeam on April 19, 2011. The
patent covers a method to blank and unblank an
electron beam with high speed and low blur, enabling
faster and more precise Electron-Beam Lithography (EBL).
Read
more...
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April 2011
Multibeam Corporation's Technical Papers in the 2011
Proceedings of the Advanced Lithography Symposium
SPIE
Santa Clara, CA – SPIE published two technical
papers by Multibeam Corporation in the 2011
Proceedings of the Advanced Lithography Symposium.
These papers follow a series of presentations on
E-Beam Lithography (EBL) in the United States and
Japan, by Multibeam.
Read
more...
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March 2011
New details on Complementary Electron-Beam
Lithography (CEBL)
Solid State Technology
Santa Clara, CA – Solid State Technology (SST) is
revealing new details on Complementary Electron-Beam
Lithography (CEBL). CEBL was introduced by Multibeam
Corporation at the SPIE Advanced Lithography
Symposium earlier this month.
Read
more... |
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March
2011
Complementary
Electron-beam Lithography Extends
Optical Litho Life
Solid State Technology
At SPIE Advanced Lithography (2/27-3/3/11, San
Jose, CA), David Lam, chairman of Multibeam Corp.,
and the founder and former CEO of Lam Research,
presented the concept of complementary e-beam
lithography (CEBL).
Read
more...
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March 2011
A
Glimpse into Intel’s Litho Future
Solid State Technology
March 7, 2011 - If anything in the litho world is
certain, it's that 193nm ArF immersion lithography
(193i) is being extended...
Read
more...
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February 2011
EE Times Interview with David K. Lam
EE Times
Santa Clara, CA – EE Times published today an
interview with David K. Lam, Chairman of Multibeam
Corporation.
The article introduces Multibeam’s Complementary
Electron-Beam Lithography (CEBL), which enables
cost-effective production of microchips at upcoming
technology generations.
Read more... |
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February 2011
Startup
Rolls Complementary Litho
EE Times
SAN JOSE, Calif. – At the SPIE Advanced Lithography
conference here, maskless startup Multibeam Corporation
will outline more details about its ongoing efforts
to commercialize its so-called Complementary E-Beam
Lithography (CEBL) technology in the market.
Read
more...
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