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EIPBN
(3-Beam Conference)
Waikoloa,
Hawaii
May 29-June
01, 2012
Multibeam Corporation will present along with Tela
Innovations...
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SEMICON West
San Francisco, California
July
12-14, 2011
Dr. David K. Lam presented...
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SPIE Advanced Lithography
San Jose, California
February 27-Mar 4, 2011
Dr. David K. Lam presented...
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SEMICON Japan
Chiba, Japan
December 1-3, 2010
Dr. David K. Lam presented...
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International Symposium on Lithography Extensions
Kobe, Japan
October 20-22, 2010
Multibeam
Corporation presented...
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News
& Events |
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Multibeam News
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n |
February 2012:
"David
Lam talks at 2012 SPIE Advanced Lithography."
Tuesday February 14, 2012
San Jose Convention Center
Ballroom J2 - 9:40AM
2012 SPIE Advanced Lithography is playing host to
industry-veteran David Lam.
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more... |
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February 2012:
"Dr. David K. Lam will present at SPIE Advanced
Lithography 2012."
12 -
16 February 2012
San Jose Convention Center and San Jose Marriott
San Jose, California, USA
At
SPIE Advanced Lithography 2012
,
Dr. David K. Lam will present
Multiple column high-throughput e-beam inspection.
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more... |
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January 2012:
"Multibeam Corporation
is a Winner of the Red Herring's 2011 Top 100 Global
Award."
Santa Clara, California - January
3, 2012 - Multibeam Corporation announced that it has
been selected as a Winner of the Red Herring's 2011 Top
100 Global award, a prestigious recognition honoring the
year's most audacious and far reaching private
technology companies and entrepreneurs from across the
globe.
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more...
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December 2011:
"Multibeam Corporation selected as a
Finalist for Red Herring Global Award."
December 5, 2011 - Multibeam Corporation
announced that it has been selected as a candidate for
Red Herring's 2011 Top 100 Global award, a prestigious
recognition honoring the year's most audacious and far
reaching private technology companies and entrepreneurs
from across the globe.
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more...
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n |
September
2011:
"e-beam lithography precision at optical
lithography speed: Complementary lithography
breaks the NGL logjam."
September 6, 2011
- What is
semiconductor lithography’s current
state? Cost is rising, debate is raging, and
a solution is wanting.
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more...
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July 2011:
"Solid State
Technology published today the column article written by
David Lam."
The
column summarizes Lam's invited talk on Extending
Optical Lithography with CEBL (Complementary E-Beam
Lithography), scheduled for
Wednesday, July 13, at noon, at the Advanced Lithography
TechXPOT.
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more...
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June 2011:
"Multibeam
Corporation selected as a Red Herring Top 100 North America Tech
Startup."
Red Herring announced that it has selected
Multibeam Corporation as a Winner of the Top 100 North America award, a
prestigious list honoring the year's most promising private technology
ventures from the North American business region.
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n |
May 2011:
"SEM
Substrates Inspection with Multiple Electron Beam Technology"
Santa Clara, CA - Multibeam Corporation
announced the addition of another key patent to its portfolio. The U.S. Patent and Trademark Office
granted US Patent # 7,941,237 to Multibeam Corporation on May 10, 2011.
The patent covers a method to inspect substrates with multiple e-beam
columns.
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more...
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April 2011:
"Another key patent granted to Multibeam
Corporation."
Multibeam Corporation
Santa Clara, CA – The
U.S. Patent and Trademark Office granted Multibeam
Corporation another key patent. US Patent #7,928,404
was issued to Multibeam on April 19, 2011. The
patent covers a method to blank and unblank an
electron beam with high speed and low blur, enabling
faster and more precise Electron-Beam Lithography (EBL).
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more...
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April 2011:
"Multibeam Corporation's technical papers in the
2011 Proceedings of the Advanced Lithography
Symposium."
SPIE
Santa Clara, CA – SPIE published two technical
papers by Multibeam Corporation in the 2011
Proceedings of the Advanced Lithography Symposium.
These papers follow a series of presentations on
E-Beam Lithography (EBL) in the United States and
Japan, by Multibeam.
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March 2011:
"New details on Complementary Electron-Beam
Lithography (CEBL)."
Solid State Technology
Santa Clara, CA – Solid State Technology (SST) is
revealing new details on Complementary Electron-Beam
Lithography (CEBL). CEBL was introduced by Multibeam
Corporation at the SPIE Advanced Lithography
Symposium earlier this month.
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more... |
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n |
March 2011:
"Complementary electron-beam lithography extends
optical litho life"
Solid State Technology
At SPIE Advanced Lithography (2/27-3/3/11, San
Jose, CA), David Lam, chairman of Multibeam Corp.,
and the founder and former CEO of Lam Research,
presented the concept of complementary e-beam
lithography (CEBL).
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more...
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March 2011:
"A glimpse into Intel’s litho future"
Solid State Technology
March 7, 2011 - If anything in the litho world is
certain, it's that 193nm ArF immersion lithography
(193i) is being extended...
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more...
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February 2011:
"EE Times interview with David K. Lam"
EETimes
Santa Clara, CA – EE Times published today an
interview with David K. Lam, Chairman of Multibeam
Corporation.
The article introduces Multibeam’s Complementary
Electron-Beam Lithography (CEBL), which enables
cost-effective production of microchips at upcoming
technology generations.
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February 2011:
"Startup rolls complementary litho"
EE Times
SAN JOSE, Calif. – At the SPIE Advanced Lithography
conference here, maskless startup Multibeam Corporation
will outline more details about its ongoing efforts
to commercialize its so-called Complementary E-Beam
Lithography (CEBL) technology in the market.
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more...
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Trade Publications
For thirty years, EE Times has been the electronics industry newspaper.
Semiconductor Magazine covers semiconductor manufacturing, industry news, semiconductor equipment, and more.
Industry Organizations
Multibeam is a SEMI member. SEMI
is the global industry association serving the manufacturing supply
chains for the microelectronic, display, and photovoltaic industries.
SPIE is an international society advancing an interdisciplinary approach to the science and application of light.
SEMATECH
(SEmiconductor MAnufacturing TECHnology) is a non-profit consortium
that performs basic research into semiconductor manufacturing.
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