HATC

     
 

EIPBN (3-Beam Conference)

Waikoloa, Hawaii

May 29-June 01, 2012
Multibeam Corporation will present along with Tela Innovations...
 

 
 

SPIE Advanced Lithography

San Jose, California

February 12-16, 2012
Dr. David K. Lam will present...
 

 
 

SEMICON West

San Francisco, California

July 12-14, 2011
Dr. David K. Lam presented...
 

 

 

SPIE Advanced Lithography
San Jose, California
February 27-Mar 4, 2011
Dr. David K. Lam presented...
 
 

 

SEMICON Japan
Chiba, Japan
December 1-3, 2010
Dr. David K. Lam presented...
 
 

 

International Symposium on Lithography Extensions
Kobe, Japan
October 20-22, 2010
Multibeam Corporation presented...
 
 
 
   
  News & Events
 
       
 

Multibeam News

n February 2012: "David Lam talks at 2012 SPIE Advanced Lithography."
Tuesday February 14, 2012
San Jose Convention Center

Ballroom J2 - 9:40AM
2012 SPIE Advanced Lithography is playing host to industry-veteran David Lam.
Read more...
   
n February 2012: "Dr. David K. Lam will present at SPIE Advanced Lithography 2012."
12 - 16 February 2012
San Jose Convention Center and San Jose Marriott
San Jose, California, USA

At SPIE Advanced Lithography 2012 , Dr. David K. Lam will present Multiple column high-throughput e-beam inspection.
Read more...
   
n January 2012: "Multibeam Corporation is a Winner of the Red Herring's 2011 Top 100 Global Award."

Santa Clara, California - January 3, 2012 - Multibeam Corporation announced that it has been selected as a Winner of the Red Herring's 2011 Top 100 Global award, a prestigious recognition honoring the year's most audacious and far reaching private technology companies and entrepreneurs from across the globe.
Read more...

   
n December 2011: "Multibeam Corporation selected as a Finalist for Red Herring Global Award."

December 5, 2011 - Multibeam Corporation announced that it has been selected as a candidate for Red Herring's 2011 Top 100 Global award, a prestigious recognition honoring the year's most audacious and far reaching private technology companies and entrepreneurs from across the globe.
Read more...

   
n September 2011: "e-beam lithography precision at optical lithography speed: Complementary lithography breaks the NGL logjam."
September 6, 2011 - What is semiconductor lithography’s current state? Cost is rising, debate is raging, and a solution is wanting.

Read more...

   
n July 2011: "Solid State Technology published today the column article written by David Lam."

The column summarizes Lam's invited talk on Extending Optical Lithography with CEBL (Complementary E-Beam Lithography), scheduled for Wednesday, July 13, at noon, at the Advanced Lithography TechXPOT.
Read more...

   
n

June 2011: "Multibeam Corporation selected as a Red Herring Top 100 North America Tech Startup."

Red Herring announced that it has selected Multibeam Corporation as a Winner of the Top 100 North America award, a prestigious list honoring the year's most promising private technology ventures from the North American business region.
Read more...

   
n

May 2011: "SEM Substrates Inspection with Multiple Electron Beam Technology"

Santa Clara, CA - Multibeam Corporation announced the addition of another key patent to its portfolio. The U.S. Patent and Trademark Office granted US Patent # 7,941,237 to Multibeam Corporation on May 10, 2011. The patent covers a method to inspect substrates with multiple e-beam columns.
Read more...

   
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April 2011: "Another key patent granted to Multibeam Corporation."
Multibeam Corporation

Santa Clara, CA – The U.S. Patent and Trademark Office granted Multibeam Corporation another key patent. US Patent #7,928,404 was issued to Multibeam on April 19, 2011. The patent covers a method to blank and unblank an electron beam with high speed and low blur, enabling faster and more precise Electron-Beam Lithography (EBL).
Read more...

   
n April 2011: "Multibeam Corporation's technical papers in the 2011 Proceedings of the Advanced Lithography Symposium."
SPIE

Santa Clara, CA – SPIE published two technical papers by Multibeam Corporation in the 2011 Proceedings of the Advanced Lithography Symposium. These papers follow a series of presentations on E-Beam Lithography (EBL) in the United States and Japan, by Multibeam.

Read more...
   
n March 2011: "New details on Complementary Electron-Beam Lithography (CEBL)."
Solid State Technology

Santa Clara, CA – Solid State Technology (SST) is revealing new details on Complementary Electron-Beam Lithography (CEBL). CEBL was introduced by Multibeam Corporation at the SPIE Advanced Lithography Symposium earlier this month.

Read more...
   
n

March 2011: "Complementary electron-beam lithography extends optical litho life"
Solid State Technology

At SPIE Advanced Lithography (2/27-3/3/11, San Jose, CA), David Lam, chairman of Multibeam Corp., and the founder and former CEO of Lam Research, presented the concept of complementary e-beam lithography (CEBL).
Read more...

   
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March 2011: "A glimpse into Intel’s litho future"
Solid State Technology

March 7, 2011 - If anything in the litho world is certain, it's that 193nm ArF immersion lithography (193i) is being extended...
Read more...

   
n February 2011: "EE Times interview with David K. Lam"
EETimes

Santa Clara, CA – EE Times published today an interview with David K. Lam, Chairman of Multibeam Corporation.
The article introduces Multibeam’s Complementary Electron-Beam Lithography (CEBL), which enables cost-effective production of microchips at upcoming technology generations.
Read more...
   
n

February 2011: "Startup rolls complementary litho"
EE Times

SAN JOSE, Calif. – At the SPIE Advanced Lithography conference here, maskless startup Multibeam Corporation will outline more details about its ongoing efforts to commercialize its so-called Complementary E-Beam Lithography (CEBL) technology in the market.
Read more...

   

Trade Publications


 
For thirty years, EE Times has been the electronics industry newspaper.

solid state technology
 
Semiconductor Magazine covers semiconductor manufacturing, industry news, semiconductor equipment, and more.

Industry Organizations

semi
 
Multibeam is a SEMI member.  SEMI is the global industry association serving the manufacturing supply chains for the microelectronic, display, and photovoltaic industries.

spie
 
SPIE is an international society advancing an interdisciplinary approach to the science and application of light.

sematech
SEMATECH (SEmiconductor MAnufacturing TECHnology) is a non-profit consortium that performs basic research into semiconductor manufacturing.