Multibeam News

Multibeam is presenting at multiple industry conferences in 2010. Multibeam is presenting “EBDW as Complementary Lithography” at SPIE Photomask / BACUS on Wednesday, September 15, 2010.  More detail to follow.

"TEL to enter maskless litho business"
EE Times (Feb 2009)
"SAN JOSE, Calif. -- Japanese equipment giant Tokyo Electron Ltd. (TEL) is quietly making an entry into the maskless lithography business.

"In recent times, TEL (Tokyo) entered into an agreement with Multibeam Systems Inc. (Santa Clara, Calif.)", a developer of multi-beam maskless lithography technology, sources said. Read more...

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