| |
Multibeam News
Industry News
Industry Events
Multibeam News
TEL to Enter Maskless
Litho Business
-
EE Times (Feb
2009)
SAN
JOSE, Calif. -- Japanese equipment giant Tokyo Electron Ltd. (TEL) is
quietly making an entry into the maskless lithography business.
In
recent times, TEL (Tokyo) entered into an agreement with Multibeam
Systems Inc. (Santa Clara, Calif.), a developer of multi-beam maskless
lithography technology, sources said.
Full
Article
Startup Multibeam Enters Maskless
Lithography Race -
EE Times (Jan 2005)
SAN JOSE, Calif. — Taking
a new approach to a growing problem, startup Multibeam Systems Inc.
this week is expected to become the latest company to enter the emerging maskless lithography market.
"At
the so-called Maskless Meeting event here — which is sponsored by
International Sematech — Multibeam on Tuesday (Jan. 18) is expected to debut a multi-electron-beam technology, based on what it calls electrostatic scalable optics."
Full Article
Industry News

SEMI
is the global industry association serving the
manufacturing supply chains for the microelectronic,
display, and photovoltaic industries.

SPIE is an international
society advancing an
interdisciplinary approach
to the science and
application of light.

For thirty years, EE Times
has been the electronics
industry newspaper.

Solid State Technology is a resource
for engineers and managers in the
worldwide semiconductor
manufacturing industry, including
breaking news.

Semiconductor Magazine covers
semiconductor manufacturing,
industry news, semiconductor
equipment, and more.

SEMATECH (SEmiconductor
MAnufacturing TECHnology) is
a non-profit consortium that
performs basic research into
semiconductor manufacturing.

Global Semiconductor Alliance (GSA) is the voice of the
global fabless semiconductor business model.

SIA represents the US
computer chip manufacturing
industry on issues of trade,
technology, environmental
protection, and worker
safety and health.
Industry Events
|
SEMICON West 2009 |
Moscone Center San Francisco,
California
Jul 14-16, 2009 |
| |
|
SPIE Photomask / BACUS 2009 |
Monterey, California
Sep 14-18, 2009 |
| |
|
SPIE Advanced Lithography 2010 |
San Jose Convention Center,
California
Feb 21-26, 2010 |
| |
|
SEMICON China 2010 |
Shanghai, China
Mar, 2010 |
| |
|
Photomask Japan 2010 |
Yokohama, Japan
2010 |
| |
|
SPIE Photomask / BACUS 2010 |
Monterey, California
Sept 13-17, 2010 |
|
|