Multibeam’s core invention is a multi-column e-beam lithography “engine”, the MBXÔ Engine, consisting of multiple individually controlled all-electrostatic e-beam columns. The proprietary electron optics technology, which eliminates all magnetic fields, enables fast beam steering and blanking and an extremely small column footprint (of less than 30mm x 30mm). Each e-beam column has its own electron source and writes independently and in parallel, with each column acting as a single-beam writer. Multibeam has over 30 patents, 15 of which have been issued.

Multibeam has developed a family of MBXÔ Engines. Each MBXÔ Engine consists of either a 10-column linear array for patterning or inspecting 300mm wafers (MBX-10), a 7-column array for 200mm wafers (MBX-7), or a 5-column array for 150mm wafers or masks (MBX-5). For higher throughput, Multibeam MBXÔ Engines may incorporate multiple linear arrays into a two-dimensional array spanning the entire wafer.

To boost throughput, each e-beam column includes a thermal field emitter (TFE) electron source and incorporates unique IP that shapes beams while retaining high current density.  High current density reduces flash time, the time it takes for resist to be exposed, enabling each Multibeam column to print a feature in tens of nanoseconds.