PRODUCTS

MEBL PLATFORM

Out of the Lab and Into the Fab!

Multi Electron Beam Lithography (MEBL) Systems
for productive, high volume manufacturing

FULLY AUTOMATED

MEBL’s staged vacuum transfer system assures precise, repeatable performance for use in state-of-the-art semiconductor fabs

E-BEAM PRECISION ON A
FAB WORTHY SYSTEM

E-BEAM PRECISION ON A FAB WORTHY SYSTEM

10x-1000x more productive than conventional e-beam
10x higher resolution than laser direct write
Patented multicolumn e-beam array
Multi-chamber, ultra high vacuum, cluster tool
10x higher precision than laser direct write

COMPACT FOOTPRINT

Efficient use of cleanroom and subfab space using cluster tool