100X
Faster time to pattern
100X
Depth of focus range
>100X
More designs per wafer
Applications
Enabling Innovative Chip Integration and Fabrication Capabilities for Next Generation
Accelerating Chip Innovation
Multibeam partners with leading device makers to push the boundaries of what is possible in advanced IC production and accelerate chip innovation for a variety of rapidly growing applications.
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Multicolumn Electron Beam Lithography
Multibeam's High-Productivity EBL Platform
Multibeam leads the multicolumn e-beam lithography market with a platform that enables rapid prototyping and production of leading-edge semiconductors with fastest time-to-market advantages for special applications like advanced packaging, compound semiconductors, MEMS & sensors, photonics, secure chip ID, and more
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Contact us to learn about our technology and products
Multibeam Corporation
1213 Innsbruck Drive
Sunnyvale, CA 94089, U.S.A.